Designing a Greater System of Protection for Fashion: The Future of Fashion Law
Thursday, February 19, 2015 | 6:00 PM – 9:00 PM
Lester Pollack Colloquium, Furman Hall (245 Sullivan Street, NY, NY 10012)
RSVP online by 2/18/15
The panel will examine the current state of fashion law. Our panel members are preparing to speak about the (1) protections currently available to the fashion industry, (2) the possible need for further protection, and (3) the means of providing further protection. We will ask each panelist about current developments in the law regarding several current protections: copyright, trademark, design patent, trade dress, and utility patent. We will also contemplate why the United States has not implemented as strong protections for fashion as several European nations and whether those protections may be a good alternative to relying heavily on the existing protections. Our panel moderator will be Barbara Kolsun.
A reception will follow the panel.
Please register at: www.csusa.org/fashion
| Contact | Julie Amadeo NYUMediaLawCollab@gmail.com |
| CLE Credit Available | Yes |